Issue |
Eur. Phys. J. AP
Volume 15, Number 3, September 2001
|
|
---|---|---|
Page(s) | 167 - 172 | |
Section | Surfaces, Interfaces and Films | |
DOI | https://doi.org/10.1051/epjap:2001178 | |
Published online | 15 September 2001 |
https://doi.org/10.1051/epjap:2001178
About the secondary electron yield and the sign of charging of electron irradiated insulators
DTI (UMR 6107), Faculté des Sciences, BP 1039, 51687 Reims Cedex 2, France
Corresponding author: jacques.cazaux@univ-reims.fr
Received:
7
February
2001
Revised:
26
April
2001
Accepted:
26
April
2001
Published online: 15 September 2001
Following the total yield approach (used to predict the sign of charging of electron
irradiated insulators) a positive charging is expected when the primary beam energy Ep is
situated in the energy range where the number of outgoing electrons, , is larger
than the number of incoming electrons, I0. But a negative charging is often experimentally observed
when a positive charging is predicted. The present paper is an attempt to elucidate this experimental
fact. The arguments being developed are based on the use of a dynamic double layer model (+ for the
secondary electron mission, SEE; − for the incident electron implantation) which explains a
negative charging via the influence of an evolving S-shape potential function,
V(z), which induces a partial freezing of the nominal (uncharged) SEE, δ°, combined to a progressive compression of the negative space charge below the surface. The
observed large difference in the measurements of the yield by using pulse excitation
methods, or by permanent irradiation methods, δ° or δ is then explained.
Furthermore, the influence of an oblique incidence is also deduced.
PACS: 79.20.Hx – Electron impact: secondary emission / 61.82.Ms – Insulators / 61.16.Bg – Transmission, reflection and scanning electron microscopy (including EBIC)
© EDP Sciences, 2001
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