| Issue |
Eur. Phys. J. Appl. Phys.
Volume 56, Number 2, November 2011
Topical Issue: 18th International Colloquium on Plasma Processes (CIP 2011)
|
|
|---|---|---|
| Article Number | 24004 | |
| Number of page(s) | 6 | |
| DOI | https://doi.org/10.1051/epjap/2011110194 | |
| Published online | 28 October 2011 | |
https://doi.org/10.1051/epjap/2011110194
Influence of nitrogen impurities on the formation of active species in Ar-O2 plasmas*
1
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, 1049-001 Lisboa, Portugal
2
Departamento de Fsica, IST, Universidade Técnica de Lisboa, Portugal
3
Research Institute for Solid State Physics and Optics, Hungarian Academy of Sciences, P.O. Box 49, 1525 Budapest, Hungary
4
Departamento de Engenharia Fsica, Faculdade de Engenharia da Universidade do Porto, 4200-465 Porto, Portugal
a e-mail: vguerra@ist.utl.pt
Received:
28
April
2011
Accepted:
1
August
2011
Published online:
28
October
2011
A self-consistent kinetic model was developed in order to study the production of active species in Ar-O2 surface-wave microwave plasmas with a relatively small N2 addition. It is shown that the Ar-O2-N2 mixture produces efficiently the same active species as an Ar-O2 discharge, including oxygen atoms, metastable O2(a1∆g) molecules and the VUV emitting Ar(4s) states. Furthermore, active N-containing species are additionally produced, in particular N atoms and NO ground-state and excited molecules, which makes the ternary mixture very interesting for numerous plasma applications.
© EDP Sciences, 2011
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