The European Physical Journal Applied Physics (EPJ AP)

Plasma growth processes inside gaps of the castellated limiter of the Tore Supra tokamak 24027

R. Ruffe, C. Martin, C. Pardanaud, G. Giacometti, P. Languille, P. Roubin and B. Pégourié

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110171

Phenol degradation in aqueous solution by a gas-liquid phase DBD reactor 24026

B. Jaramillo-Sierra, A. Mercado-Cabrera, R. López-Callejas, J.A. López-Fernández, R. Peña-Eguiluz, S.R. Barocio, R. Valencia-Alvarado, B. Rodríguez-Méndez, A. Muñoz-Castro and A. de la Piedad-Beneitez

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110174

Conversion of carbon oxides into methane in a nonthermal plasma-catalytic reactor 24025

E.J. Jwa, Y.S. Moks and S.B. Lee

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110149

Biocompatibility of oxygen-plasma-treated polystyrene substrates 24024

A. Vesel, M. Mozetic, M. Jaganjac, L. Milkovic, A. Cipak and N. Zarkovic

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110169

Trends in surface engineering of biomaterials: atmospheric pressure plasma deposition of coatings for biomedical applications 24023

G. Da Ponte, E. Sardella, F. Fanelli, R. d’Agostino and P. Favia

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110192

Study of superficial properties of titanium treated by PIIID 24022

R.C.C. Rangel, E.C. Rangel, R.M. Oliveira, M. Ueda, W.H. Schreiner and N.C. Cruz

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110173

Open Access

A multi-ion beam microanalysis approach for the characterization of plasma polymerized allylamine films 24021

E. Punzón-Quijorna, V. Torres-Costa, A. Climent-Font and M. Manso-Silván

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110168

Synthesis and surface engineering of nanomaterials by atmospheric-pressure microplasmas 24020

J. McKenna, J. Patel, S. Mitra, N. Soin, V. Švrček, P. Maguire and D. Mariotti

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110203

Nano-droplet ejection and nucleation of materials submitted to non-thermal plasma filaments 24019

J.-P. Borra, N. Jidenko, C. Dutouquet, O. Aguerre, J. Hou and A. Weber

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110201

Plasma inhomogeneities near the electrodes of a capacitively-coupled radio-frequency discharge containing dust particles 24018

H. Tawidian, M. Mikikian, L. Couëdel and T. Lecas

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110163

Plasma polymerization of TEOS for QCM-based VOC vapor sensing 24017

A. Bougharouat, A. Bellel, S. Sahli, Y. Ségui and P. Raynaud

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110144

Ion flux-film structure relationship during magnetron sputtering of WO₃ 24016

A. Hemberg, S. Konstantinidis, F. Renaux, J.P. Dauchot and R. Snyders

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110200

Plasma deposition of polymer composite films incorporating nanocellulose whiskers 24015

P. Samyn, A. Airoudj, M.-P. Laborie, A.P. Mathew and V. Roucoules

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110170

Hydrogenated amorphous carbon as protective coating for a forming tool 24014

J.F. Martinatti, L.V. Santos, N.C. Cruz and E.C. Rangel

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110166

Properties study of silicon carbide thin films prepared by electron cyclotron resonance plasma technology 24013

A. Valovič, J. Huran, M. Kučera, A.P. Kobzev and Š. Gaži

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110153

Towards control of plasma-induced surface roughness: simultaneous to plasma etching deposition 24012

G. Kokkoris

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110205

Cryo-FALP study of collisional-radiative recombination of Ar⁺ ions at 40–200 K 24011

T. Kotrík, P. Dohnal, P. Rubovič, R. Plašil, Š. Roučka, S. Opanasiuk and J. Glosík

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110158

Ternary association of H⁺ ion with H₂ at 11 K, experimental study 24010

I. Zymak, P. Jusko, Š. Roučka, R. Plašil, P. Rubovič, D. Gerlich and J. Glosík

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110172

LIF spectroscopy of OH radicals in a micro-flow DC discharge in Ar and He with a liquid electrode 24009

A. Nikiforov, L. Li, Q. Xiong, C. Leys and X.P. Lu

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110165

Hydrodynamic study of a microwave plasma torch 24008

K. Gadonna, O. Leroy, T. Silva, P. Leprince, C. Boisse-Laporte and L.L. Alves

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110161

Transition from edge-localized to center-localized power deposition in helicon discharges 24007

D. Curreli

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110159

Computational study of sheath structure in chemically active plasmas 24006

P. Cerny, S. Novak, R. Hrach and V. Hrachova

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110164

2D simulation of active species and ozone production in a multi-tip DC air corona discharge 24005

M. Meziane, O. Eichwald, J.P. Sarrette, O. Ducasse and M. Yousfi

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110154

Influence of nitrogen impurities on the formation of active species in Ar-O₂ plasmas 24004

V. Guerra, K. Kutasi, P.A. Sá and M. Lino da Silva

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110194

A study of physical processes in microplasma capillary discharges 24003

N. Denisova, E. Bogans, G. Revalde and Ja. Skudra

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110157

Reactive ionized physical vapor deposition of thin films 24002

S. Konstantinidis and R. Snyders

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110199

Free Access

Editorial

Special issue on Plasma Processes 24001

L.L. Alves and Y. Ségui

Published online: 28 October 2011

DOI: https://doi.org/10.1051/epjap/2011110375

PDF (107.4 KB)

The European Physical Journal Applied Physics

Volume 56 / No 2 (November 2011)

Topical Issue: 18th International Colloquium on Plasma Processes (CIP 2011)

Plasma growth processes inside gaps of the castellated limiter of the Tore Supra tokamak 24027

Phenol degradation in aqueous solution by a gas-liquid phase DBD reactor 24026

Conversion of carbon oxides into methane in a nonthermal plasma-catalytic reactor 24025

Biocompatibility of oxygen-plasma-treated polystyrene substrates 24024

Trends in surface engineering of biomaterials: atmospheric pressure plasma deposition of coatings for biomedical applications 24023

Study of superficial properties of titanium treated by PIIID 24022

A multi-ion beam microanalysis approach for the characterization of plasma polymerized allylamine films 24021

Synthesis and surface engineering of nanomaterials by atmospheric-pressure microplasmas 24020

Nano-droplet ejection and nucleation of materials submitted to non-thermal plasma filaments 24019

Plasma inhomogeneities near the electrodes of a capacitively-coupled radio-frequency discharge containing dust particles 24018

Plasma polymerization of TEOS for QCM-based VOC vapor sensing 24017

Ion flux-film structure relationship during magnetron sputtering of WO₃ 24016

Plasma deposition of polymer composite films incorporating nanocellulose whiskers 24015

Hydrogenated amorphous carbon as protective coating for a forming tool 24014

Properties study of silicon carbide thin films prepared by electron cyclotron resonance plasma technology 24013

Towards control of plasma-induced surface roughness: simultaneous to plasma etching deposition 24012

Cryo-FALP study of collisional-radiative recombination of Ar⁺ ions at 40–200 K 24011

Ternary association of H⁺ ion with H₂ at 11 K, experimental study 24010

LIF spectroscopy of OH radicals in a micro-flow DC discharge in Ar and He with a liquid electrode 24009

Hydrodynamic study of a microwave plasma torch 24008

Transition from edge-localized to center-localized power deposition in helicon discharges 24007

Computational study of sheath structure in chemically active plasmas 24006

2D simulation of active species and ozone production in a multi-tip DC air corona discharge 24005

Influence of nitrogen impurities on the formation of active species in Ar-O₂ plasmas 24004

A study of physical processes in microplasma capillary discharges 24003

Reactive ionized physical vapor deposition of thin films 24002

Special issue on Plasma Processes 24001

The European Physical Journal Applied Physics

Volume 56 / No 2 (November 2011)

Topical Issue: 18th International Colloquium on Plasma Processes (CIP 2011)

Plasma growth processes inside gaps of the castellated limiter of the Tore Supra tokamak 24027

Phenol degradation in aqueous solution by a gas-liquid phase DBD reactor 24026

Conversion of carbon oxides into methane in a nonthermal plasma-catalytic reactor 24025

Biocompatibility of oxygen-plasma-treated polystyrene substrates 24024

Trends in surface engineering of biomaterials: atmospheric pressure plasma deposition of coatings for biomedical applications 24023

Study of superficial properties of titanium treated by PIIID 24022

A multi-ion beam microanalysis approach for the characterization of plasma polymerized allylamine films 24021

Synthesis and surface engineering of nanomaterials by atmospheric-pressure microplasmas 24020

Nano-droplet ejection and nucleation of materials submitted to non-thermal plasma filaments 24019

Plasma inhomogeneities near the electrodes of a capacitively-coupled radio-frequency discharge containing dust particles 24018

Plasma polymerization of TEOS for QCM-based VOC vapor sensing 24017

Ion flux-film structure relationship during magnetron sputtering of WO3 24016

Plasma deposition of polymer composite films incorporating nanocellulose whiskers 24015

Hydrogenated amorphous carbon as protective coating for a forming tool 24014

Properties study of silicon carbide thin films prepared by electron cyclotron resonance plasma technology 24013

Towards control of plasma-induced surface roughness: simultaneous to plasma etching deposition 24012

Cryo-FALP study of collisional-radiative recombination of Ar+ ions at 40–200 K 24011

Ternary association of H+ ion with H2 at 11 K, experimental study 24010

LIF spectroscopy of OH radicals in a micro-flow DC discharge in Ar and He with a liquid electrode 24009

Hydrodynamic study of a microwave plasma torch 24008

Transition from edge-localized to center-localized power deposition in helicon discharges 24007

Computational study of sheath structure in chemically active plasmas 24006

2D simulation of active species and ozone production in a multi-tip DC air corona discharge 24005

Influence of nitrogen impurities on the formation of active species in Ar-O2 plasmas 24004

A study of physical processes in microplasma capillary discharges 24003

Reactive ionized physical vapor deposition of thin films 24002

Special issue on Plasma Processes 24001

Ion flux-film structure relationship during magnetron sputtering of WO₃ 24016

Cryo-FALP study of collisional-radiative recombination of Ar⁺ ions at 40–200 K 24011

Ternary association of H⁺ ion with H₂ at 11 K, experimental study 24010

Influence of nitrogen impurities on the formation of active species in Ar-O₂ plasmas 24004