Issue |
Eur. Phys. J. Appl. Phys.
Volume 45, Number 1, January 2009
|
|
---|---|---|
Article Number | 10302 | |
Number of page(s) | 7 | |
Section | Semiconductors and Devices | |
DOI | https://doi.org/10.1051/epjap:2008191 | |
Published online | 14 January 2009 |
https://doi.org/10.1051/epjap:2008191
Temperature-dependent Schottky barrier inhomogeneity of Ni/n-GaAs diodes
Department of Physics, Faculty of Sciences, Atatürk University,
25240 Erzurum, Turkey
Corresponding author: aturut@atauni.edu.tr
Received:
4
September
2008
Revised:
24
September
2008
Accepted:
9
October
2008
Published online:
14
January
2009
We have reported a study of the I–V characteristics of
Ni/n-GaAs Schottky barrier diodes (SBDs) in a wide temperature range of
60–320 K by a step of 20 K, which are prepared by magnetron DC sputtering.
The experimental I–V data of the device quite well obey the thermionic emission
model at 300 and 320 K, respectively. The ideality factor and barrier height
values have changed by change of the sample temperature, the case has been
attributed to the presence of the lateral inhomogeneities of the barrier
height. The barrier inhomogeneity has been explained by the Gaussian
distribution models of barrier heights suggested by some authors, Y.-L. Jiang et al. [Chin. Phys. Lett. 19, 553 (2002)]; Y.-L.
Jiang et al. [J. Appl. Phys. 93, 866 (2003)], and S. Chand, J. Kumar [Appl. Phys. A 65, 497 (1997)]. It has been seen that the SBH
inhomogeneity of our Ni/n-GaAs SBD can be well described by Gaussian
distribution model suggested by Y.-L. Jiang et al. [Chin. Phys. Lett. 19, 553 (2002)]; Y.-L. Jiang et al. [J. Appl. Phys.
93, 866 (2003)] over whole
measurement temperature range. Moreover, the modified ln()
versus
plot is obtained using a method developed for
T0 anomaly in the literature. Richardson constant value of 3.37 A cm-2 K-2 for n-type GaAs was obtained from the modified Richardson
plot.
PACS: 73.30.+y – Surface double layers, Schottky barriers, and work functions / 73.40.-c – Electronic transport in interface structures / 73.40.Ei – Rectification / 73.40.Sx – Metal-semiconductor-metal structures
© EDP Sciences, 2008
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