| Issue |
Eur. Phys. J. Appl. Phys.
Volume 31, Number 2, August 2005
|
|
|---|---|---|
| Page(s) | 139 - 145 | |
| Section | Instrumentation and Metrology | |
| DOI | https://doi.org/10.1051/epjap:2005049 | |
| Published online | 18 August 2005 | |
https://doi.org/10.1051/epjap:2005049
Production of gold tips for tip-enhanced near-field optical microscopy and spectroscopy: analysis of the etching parameters
Laboratoire de nanotechnologie et d'instrumentation optique, CNRS FRE 2671,
Université de Technologie de Troyes, 12 rue Marie Curie, BP 2060, 10010 Troyes, France
Corresponding author: marc.lamy_de_la_chapelle@utt.fr
Received:
8
November
2004
Revised:
10
February
2005
Accepted:
24
March
2005
Published online:
18
August
2005
In this paper, we analyze in detail the etching parameters that are used for manufacturing gold tips for tip-enhanced near-field optical microscopy and spectroscopy. From the current variation versus time, we first demonstrate that the sharpest tips are obtained if the etching is stopped at a specific time where the curve presents an inflexion point. We then analyze the influence of the concentration of the etching solution and the applied voltage on the roughness and the tip apex. As a result, we propose a set of parameters allowing for reproducible production of gold tips with 20 nm radius of curvature.
PACS: 81.16.-c – Methods of nanofabrication and processing / 82.45.Yz – Nanostructured materials in electrochemistry / 81.07.-b – Nanoscale materials and structures: fabrication and characterization / 07.79.-v – Scanning probe microscopes and components
© EDP Sciences, 2005
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