Eur. Phys. J. Appl. Phys.
Volume 27, Number 1-3, July-September 2004Tenth International Conference on Defects: Recognition, Imaging and Physics in Semiconductors (DRIP X)
|Page(s)||111 - 114|
|Section||Defects in silicon|
|Published online||15 July 2004|
Transformation behavior of metastable defects induced in n-type silicon by hydrogen implantation
Department of Electronics, Aichi Institute of Technology, Yakusa, Toyota 470-0392, Japan
2 Toyota Central R&D Labs., Inc., Nagakute, Aichi 480-1192, Japan
Corresponding author: email@example.com
Accepted: 9 December 2003
Published online: 15 July 2004
We report on the transformation behaviour of metastable defects labelled EM1 (Ec-0.29 eV), EM2 (Ec-0.41 eV) and EM3 (Ec-0.55 eV) which are induced in n-type silicon by hydrogen implantation. Hydrogen implantation was performed at 88 K with an energy of 90 keV to a dose of 2 × 1010 cm−2. After fabrication of Schottky diodes on the implanted surfaces, deep level transient spectroscopy measurements were made to monitor metastable behaviour of defects. All three metastable defects are regenerated with reverse-bias cooling and removed with zero-bias cooling. 10-min isochronal annealing reveals that EM1 is regenerated around 270 K and is removed around 220 K. The EM2 (EM3) regeneration temperature is around 270 K (270 K) and its removal temperature 220 K (260 K). Isothermal annealing treatments for EM1 show that its transformation follows first order kinetics for both regeneration and removal. An activation energy is 0.94 eV and a frequency factor 6 × 1014 s−1 for regeneration of EM1, and 0.73 eV and 3 × 1013 s−1 for its removal.
PACS: 71.55.Cn – Elemental semiconductors
© EDP Sciences, 2004
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.