| Issue |
Eur. Phys. J. AP
Volume 4, Number 3, December 1998
|
|
|---|---|---|
| Page(s) | 275 - 280 | |
| DOI | https://doi.org/10.1051/epjap:1998271 | |
| Published online | 15 December 1998 | |
https://doi.org/10.1051/epjap:1998271
Structure of an Al-Ge alloy by energy filtered TEM and EELS spectroscopy
1
Département de Recherches Fondamentales sur la Matière Condensée
CEA-Grenoble, 17 avenue des Martyrs, 38054 Grenoble Cedex 9, France
2
Department of Electrical Engineering and Physical Electronics,
Faculty of Engineering,
Tel Aviv University Ramat Aviv 69978, Israel
Corresponding author: jpenisson@cea.fr
Received:
10
April
1998
Accepted:
27
July
1998
Published online: 15 December 1998
Samples of a partially crystallized amorphous aluminium-germanium alloy are observed using high resolution electron microscopy, chemical imaging, and electron energy loss spectroscopy. Aluminium rich domains with a size 5 to 7 nm are clearly observed on plasmon and chemical images using the specific edges of Al and Ge. The contrast of the plasmon images is attributed to differences in the intensity of the plasmon peak between the different phases.
Résumé
Des échantillons d'un alliage aluminium-germanium amorphe, partiellement cristallisé sont observés en microscopie électronique à haute résolution, en imagerie chimique et en spectroscopie de pertes d'énergie. Des domaines riches en aluminium d'une taille moyenne 5 à 7 nm sont observés sur des images utilisant le pic de plasmons et les pertes caractéristiques de l'aluminium et du germanium. Le contraste des images de plasmons est attribué à la différence d'intensité relative de ce pic dans les différentes phases.
PACS: 61.72.Ff – Direct observation of dislocations and other defects (etch pits, decoration, electron microscopy, X-ray topography, etc.) / 61.43.Dq – Amorphous semiconductors, metals, and alloys
© EDP Sciences, 1998
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