Eur. Phys. J. Appl. Phys.
Volume 34, Number 2, May 2006
|Page(s)||73 - 76|
|Section||Semiconductors and Related Materials|
|Published online||25 May 2006|
Effects of focus lens position on pulsed laser deposition of ZnO films
College of Physics and Electronics, Shandong Normal University, Jinan, 250014, China
Corresponding author: firstname.lastname@example.org
Revised: 14 November 2005
Accepted: 26 December 2005
Published online: 25 May 2006
ZnO thin films have been deposited on Si(111) substrates at different positions of the focusing lens by pulsed laser deposition (PLD) of a ZnO target in an oxygen atmosphere. The strong influence of the position of the focusing lens on the deposition rate, crystallinity, surface morphology and optical properties of the deposited ZnO thin films are studied. The results show that the ZnO thin films deposited at lens-target distance cm (the focal length is 70 cm) have the highest deposition rate and crystalline quality. The photoluminescence (PL) spectrum with the strongest ultraviolet (UV) peak and blue peak is observed in this condition. Moreover, the results of scanning electron microscopy (SEM) and selected area electron diffraction (SEAD) indicate that the films deposited at this lens position show the transition from monocrystalline to polycrystalline. Perfect monocrystalline ZnO films are obtained only when Dl-t is changed in the range from 63 cm to the focus position.
PACS: 81.15.Fg – Laser deposition / 81.05.-t – Specific materials: fabrication, treatment, testing, and analysis / 68.55.-a – Thin film structure and morphology
© EDP Sciences, 2006
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