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Cited article:

Recent progress in direct patterning technologies based on nano-imprint lithography

K.-J. Byeon, H. Lee

Eur. Phys. J. Appl. Phys., 59 1 (2012) 10001

Published online: 2012-08-03

DOI: https://doi.org/10.1051/epjap/2012120166

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