Recent progress in direct patterning technologies based on nano-imprint lithography

Department of Materials Science and Engineering, Korea University, 5-1 Anam-dong, Sungbuk-gu, Seoul, 136-713, South Korea

^a e-mail: heonlee@korea.ac.kr

Received: 30 April 2012
Revised: 27 June 2012
Accepted: 2 July 2012
Published online: 3 August 2012

Abstract

Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano- and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano- and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using convention lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano- and micro-structures and thus can be usefully applied to various industries.