EDP Sciences logo
Subscriber Authentication Point
Sciengine logo
Search
Menu
All issues Eur. Phys. J. Appl. Phys., 42 3 (2008) 351-359 Article references

Articles citing this article

The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).

Cited article:

Condition-number-based measurement configuration optimization for nanostructure reconstruction by optical scatterometry

Tianjuan Yang, Xiuguo Chen, Shuo Liu, Jiahao Zhang and Shiyuan Liu
Measurement Science and Technology 34 (12) 125001 (2023)
https://doi.org/10.1088/1361-6501/acec8d

Effects of Measurement Configurations on the Sensitivity of Morpho Butterfly Scales Based Chemical Biosensor

Zhengqiong Dong, Hang Zhao, Lei Nie, et al.
Frontiers in Physics 9 (2022)
https://doi.org/10.3389/fphy.2021.806904

Characterization of pixelated nanogratings in 3D holographic display by an imaging Mueller matrix ellipsometry

Chao Chen, Xiuguo Chen, Zhongwen Xia, et al.
Optics Letters 47 (14) 3580 (2022)
https://doi.org/10.1364/OL.459522

Nanoscale limits of angular optical scatterometry

Ruichao Zhu, Juan J. Faria-Briceno, S. R. J. Brueck, Praveen Joseph, Shrawan Singhal and S. V. Sreenivasan
AIP Advances 10 (1) (2020)
https://doi.org/10.1063/1.5092802

Extracting optical constants of solid materials with micro-rough surfaces from ellipsometry without using effective medium approximation

Yuanbin Liu, Jun Qiu, Linhua Liu and Bingyang Cao
Optics Express 27 (13) 17667 (2019)
https://doi.org/10.1364/OE.27.017667

Parametric sensitivity analysis as an essential ingredient of spectroscopic ellipsometry data modeling: An application of the Morris screening method

D. V. Likhachev
Journal of Applied Physics 126 (18) (2019)
https://doi.org/10.1063/1.5126074

Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes

Alok Vaid, Jody Fronheiser, Vinit Todi, et al.
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (03) 1 (2018)
https://doi.org/10.1117/1.JMM.17.3.034001

Probing optimal measurement configuration for optical scatterometry by the multi-objective genetic algorithm

Xiuguo Chen, Honggang Gu, Hao Jiang, Chuanwei Zhang and Shiyuan Liu
Measurement Science and Technology 29 (4) 045014 (2018)
https://doi.org/10.1088/1361-6501/aaa8af

Martha I. Sanchez, Vladimir A. Ukraintsev, Dhairya Dixit, Nick Keller, Taher Kagalwala, Fiona Recchia, Yevgeny Lifshitz, Alexander Elia, Vinit Todi, Jody Fronheiser and Alok Vaid
10145 101451H (2017)
https://doi.org/10.1117/12.2261430

Optimization and optical characterization of vertical nanowire arrays for core-shell structure solar cells

Martin Foldyna, Alienor Svietlana Togonal, Rusli and Pere Roca i Cabarrocas
Solar Energy Materials and Solar Cells 159 640 (2017)
https://doi.org/10.1016/j.solmat.2016.06.014

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

Dhairya Dixit, Avery Green, Erik R. Hosler, et al.
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (1) 014004 (2016)
https://doi.org/10.1117/1.JMM.15.1.014004

Metrology and Diagnostic Techniques for Nanoelectronics

Samuel O’Mullane, Dhairya Dixit and Alain Diebold
Metrology and Diagnostic Techniques for Nanoelectronics 65 (2016)
https://doi.org/10.1201/9781315185385-5

Analysis and detection of an incorrect profile shape in a classical scatterometric process

Zaki Sabit Fawzi, Stéphane Robert, Ismail El Kalyoubi and Bernard Bayard
The European Physical Journal Applied Physics 76 (3) 31001 (2016)
https://doi.org/10.1051/epjap/2016160157

Efficient thin-film stack characterization using parametric sensitivity analysis for spectroscopic ellipsometry in semiconductor device fabrication

D.V. Likhachev
Thin Solid Films 589 258 (2015)
https://doi.org/10.1016/j.tsf.2015.05.049

Dispersion of polarization coupling, localized and collective plasmon modes in a metallic photonic crystal mapped by Mueller Matrix Ellipsometry

Thomas Brakstad, Morten Kildemo, Zahra Ghadyani and Ingve Simonsen
Optics Express 23 (17) 22800 (2015)
https://doi.org/10.1364/OE.23.022800

Jason P. Cain, Martha I. Sanchez, Dhairya Dixit, Erik R. Hosler, Moshe Preil, Nick Keller, Joseph Race, Jun Sung Chun, Michael O’Sullivan, M. Warren Montgomery and Alain Diebold
9424 94240T (2015)
https://doi.org/10.1117/12.2085054

Interpretation of azimuthal angle dependence of periodic gratings in Mueller matrix spectroscopic ellipsometry

Anett Heinrich, Jörg Bischoff, Kurt Meiner, et al.
Journal of the Optical Society of America A 32 (4) 604 (2015)
https://doi.org/10.1364/JOSAA.32.000604

Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, et al.
Optics Express 22 (12) 15165 (2014)
https://doi.org/10.1364/OE.22.015165

Jason P. Cain, Martha I. Sanchez, Robin Chao, Kriti Kohli, Yunlin Zhang, Anita Madan, G. Raja Muthinti, Augustin J. Hong, David Conklin, Judson Holt and Todd C. Bailey
9050 90501E (2014)
https://doi.org/10.1117/12.2057402

Determination of an optimal measurement configuration in optical scatterometry using global sensitivity analysis

Zhengqiong Dong, Shiyuan Liu, Xiuguo Chen and Chuanwei Zhang
Thin Solid Films 562 16 (2014)
https://doi.org/10.1016/j.tsf.2014.03.051

Dimensional characterization of biperiodic imprinted structures using optical scatterometry

Issam Gereige, David Pietroy, Jessica Eid and Cécile Gourgon
Microelectronic Engineering 112 27 (2013)
https://doi.org/10.1016/j.mee.2013.05.022

Advances in Optical and Magnetooptical Scatterometry of Periodically Ordered Nanostructured Arrays

Martin Veis, Roman Antos and Yue Li
Journal of Nanomaterials 2013 (1) (2013)
https://doi.org/10.1155/2013/621531

Application of Spectroscopic Ellipsometry and Mueller Ellipsometry to Optical Characterization

Enric Garcia-Caurel, Antonello De Martino, Jean-Paul Gaston and Li Yan
Applied Spectroscopy 67 (1) 1 (2013)
https://doi.org/10.1366/12-06883

Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry

Xiuguo Chen, Chuanwei Zhang and Shiyuan Liu
Applied Physics Letters 103 (15) (2013)
https://doi.org/10.1063/1.4824760

Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology

Shiyuan Liu
Optical Engineering 51 (8) 081504 (2012)
https://doi.org/10.1117/1.OE.51.8.081504