Eur. Phys. J. Appl. Phys.
Volume 79, Number 1, July 2017
The 15th International Symposium on High Pressure Low Temperature Plasma Chemistry (HAKONE XV)
Article Number 10802
Number of page(s) 8
Section Plasma, Discharges and Processes
Published online 30 May 2017
  1. U. Kogelschatz, Plasma Chem. Plasma Process. 23, 1 (2003) [CrossRef] [Google Scholar]
  2. S. Okazaki, M. Kogoma, M. Uehara, Y. Kimura, J. Phys. Appl. Phys. 26, 889 (1993) [CrossRef] [Google Scholar]
  3. F. Massines, N. Gherardi, N. Naudé, P. Segur, Eur. Phys. J. Appl. Phys. 47, 22805 (2009) [CrossRef] [EDP Sciences] [Google Scholar]
  4. R. Tschiersch, M. Bogaczyk, H.-E. Wagner, J. Phys. D: Appl. Phys. 47, 365204 (2014) [CrossRef] [Google Scholar]
  5. I. Brauer, M. Bode, E. Ammelt, H.-G. Purwins, Phys. Rev. Lett. 84, 4104 (2000) [CrossRef] [PubMed] [Google Scholar]
  6. I. Radu, R. Bartnikas, G. Czeremuszkin, M.R. Wertheimer, Plasma Sci. IEEE Trans. 31, 411 (2003) [CrossRef] [Google Scholar]
  7. W. Breazeal, K.M. Flynn, E.G. Gwinn, Phys. Rev. E 52, 1503 (1995) [Google Scholar]
  8. E.L. Gurevich, A.L. Zanin, A.S. Moskalenko, H.-G. Purwins, Phys. Rev. Lett. 91, 154501 (2003) [CrossRef] [PubMed] [Google Scholar]
  9. B. Li, L. Dong, C. Zhang, Z. Shen, X. Zhang, J. Phys. D: Appl. Phys. 47, 055205 (2014) [CrossRef] [Google Scholar]
  10. J.P. Boeuf, B. Bernecker, T. Callegari, S. Blanco, R. Fournier, Appl. Phys. Lett. 100, 244108 (2012) [Google Scholar]
  11. B. Bernecker, T. Callegari, J.P. Boeuf, J. Phys. D: Appl. Phys. 44, 262002 (2011) [CrossRef] [Google Scholar]
  12. R. Wild, T. Schumann, L. Stollenwerk, Plasma Sources Sci. Technol. 23, 054004 (2014) [Google Scholar]
  13. S. Stauss, H. Muneoka, N. Ebato, F. Oshima, D.Z. Pai, K. Terashima, Plasma Sources Sci. Technol. 22, 025021 (2013) [Google Scholar]
  14. M. Bogaczyk, R. Wild, L. Stollenwerk, H.-E. Wagner, J. Phys. D: Appl. Phys. 45, 465202 (2012) [CrossRef] [Google Scholar]
  15. N. Naudé, J.-P. Cambronne, N. Gherardi, F. Massines, J. Phys. D: Appl. Phys. 38, 530 (2005) [CrossRef] [Google Scholar]
  16. A. Ricard, Ph. Décomps, F. Massines, Surf. Coat. Technol. 112, 1 (1999) [Google Scholar]
  17. T. Martens, A. Bogaerts, W.J.M. Brok, J. van Dijk, Appl. Phys. Lett. 92, 041504 (2008) [Google Scholar]
  18. N.K. Bibinov, A.A. Fatev, K. Wiesmann, Plasma Sources Sci. Technol. 10, 579 (2001) [Google Scholar]
  19. C. Lazarou, D. Koukounis, A.S. Chiper, C. Costin, I. Topala, C.E. Georghiou, Plasma Sources Sci. Technol. 24, 035012 (2015) [Google Scholar]
  20. E.A.D. Carbone, C.G. Schregel, U. Czarnetzki, Plasma Sources Sci. Technol. 25, 054004 (2016) [Google Scholar]
  21. B. Niermann, A. Kanitz, M. Böke, J. Winter, J. Phys. D: Appl. Phys. 44, 325201 (2011) [CrossRef] [Google Scholar]
  22. A. Belinger, N. Naudé, N. Gherardi, Plasma Sci. IEEE Trans. 42, 2816 (2014) [CrossRef] [Google Scholar]

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