Open Access
Issue |
Eur. Phys. J. Appl. Phys.
Volume 78, Number 2, May 2017
The 15th International Symposium on High Pressure Low Temperature Plasma Chemistry (HAKONE XV)
|
|
---|---|---|
Article Number | 20804 | |
Number of page(s) | 7 | |
Section | Plasma, Discharges and Processes | |
DOI | https://doi.org/10.1051/epjap/2017160471 | |
Published online | 19 May 2017 |
- B. Eliasson, U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 1063 (1991) [CrossRef] [Google Scholar]
- P. Olszewski, J.F. Li, D.X. Liu, J.L. Walsh, J. Hazardous Mater. 279, 60 (2014) [CrossRef] [Google Scholar]
- M.J. Pavlovich, H.-W. Chang, Y. Sakiyama, D.S. Clark, D.B. Graves, J. Phys. D: Appl. Phys. 46, 145202 (2013) [CrossRef] [Google Scholar]
- Y. Zhou, G. Huang, T. Wang, S.J. MacGregor, Q. Ren, M.P. Wilson, I.V. Timoshkin, IEEE Trans. Plasma. Sci. 44, 2129 (2016) [CrossRef] [Google Scholar]
- X. Zhang, B.J. Lee, H.G. Im, M.S. Cha, IEEE Trans. Plasma Sci. 44, 2288 (2016) [CrossRef] [Google Scholar]
- T. Shoyama, Y. Yoshioka, Electr. Eng. Jpn 161, 1 (2007) [CrossRef] [Google Scholar]
- N. Osawa, Y. Yoshioka, IEEE Trans. Plasma Sci. 40, 2 (2011) [CrossRef] [Google Scholar]
- N. Osawa, H. Kaga, Y. Fukuda, S. Harada, Y. Yoshioka, R. Hanaoka, Eur. Phys. J. Appl. Phys. 55, 13802 (2011) [CrossRef] [EDP Sciences] [Google Scholar]
- Y. Nakai, A. Takashi, N. Osawa, Y. Yoshioka, R. Hanaoka, in Proceedings of the 20th International Symposium on Plasma Chemistry, Philadelphia, 2011 [Google Scholar]
- N. Osawa, Y. Yoshioka, J. Adv. Oxid. Technol. 17, 217 (2014) [Google Scholar]
- N. Osawa, A. Takashi, Y. Yoshioka, R. Hanaoka, Eur. Phys. J. Appl. Phys. 61, 24317 (2013) [CrossRef] [EDP Sciences] [Google Scholar]
- J. Kitayama, M. Kuzumoto, J. Phys. D: Appl. Phys. 32, 3032 (1999) [CrossRef] [Google Scholar]
- N. Osawa, T. Tsuji, Y. Yoshioka, in Proceedings of the 15th International Symposium on High Pressure Low Temperature Plasma Chemistry, Brno, 2016 [Google Scholar]
- N. Osawa, Y. Yoshioka, R. Hanaoka, Y. Mochizuki, Y. Kobayashi, Y. Yamada, Electr. Eng. Jpn 180, 1 (2012) [CrossRef] [Google Scholar]
- A. Fridman, Plasma Chemistry (Cambridge University Press, 2008) [CrossRef] [Google Scholar]
- F. Massines, N. Gherardi, N. Naudé, P. Ségur, Eur. Phys. J. Appl. Phys. 47, 22805 (2009) [CrossRef] [EDP Sciences] [Google Scholar]
- K.V. Kozlov, R. Brandenburg, H.-E. Wagner, A.M. Morozov, P. Michel, J. Phys. D: Appl. Phys. 38, 518 (2005) [CrossRef] [Google Scholar]
- U. Kogelschatz, IEEE Trans. Plasma Sci. 30, 1400 (2002) [CrossRef] [Google Scholar]
- M. Laroussi, K.H. Schoenbach, U. Kogelschatz, R.J. Vidmar, S. Kuo, M. Schmidt, J.J. Behnke, K. Yukimura, E. Stoffels, Non-equilibrium Air Plasmas at Atmospheric Pressure (IOP Publishing, Bristol, 2005) [Google Scholar]
- N.A. Popov, J. Phys. D: Appl. Phys. 44, 285201 (2011) [CrossRef] [Google Scholar]
- G.J.M. Hagelaar, L.C. Pitchford, Plasma Source. Sci. Technol. 14, 722 (2005) [Google Scholar]
- I.A. Kossyi, A.Y. Kostinsky, A.A. Matveyev, V.P. Silakov, Plasma Sources Sci. Technol. 1, 207 (1992) [Google Scholar]
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.