Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approach | The European Physical Journal Applied Physics (EPJ AP)

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Table 2

Crystallographic phases of the three films determined by polyhedral template matching method.

Films	Hcp (%)	Fcc (%)	Disordered¹ (%)
MS	20	25	55
Ta₇₅Ta⁺₂₅	29	28	43
Ta₁₀Ta⁺₉₀	22	30	48

¹Disordered means that PTM method does not match with any structure.

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