Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approach | The European Physical Journal Applied Physics (EPJ AP)

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Fig. 3

Snapshots of the deposited films: a) MS (Ta and incoming species), b) HiPIMS moderate ion flux, c) HiPIMS high ion flux and the same without the substrate for observing the diffusion of incoming species, d) MS (Ta and incoming species), e) HiPIMS moderate ion flux, f) HiPIMS high ion flux.

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