Fig. A1
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X-ray diffractograms (20° ≤ 2θ ≤ 65°) recorded at different temperatures during in situ annealing of as-deposited Mg0.6Sb0.4 film by non-diffusive reaction (Mg3Sb2: star and Sb: diamond),Inset: schematic illustration of the 100 nm thick Mg0.6Sb0.4/SiO2 sample.
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