Eur. Phys. J. Appl. Phys.
Volume 64, Number 1, October 2013
|Number of page(s)||8|
|Published online||03 October 2013|
Optical properties and thermal stability of alumina films grown by pulsed laser deposition
Department of Physics, Guru Nanak Dev University, Amritsar, Punjab 143005, India
a e-mail: firstname.lastname@example.org
Revised: 5 April 2013
Accepted: 1 August 2013
Published online: 3 October 2013
Thin films of aluminum oxide of thickness 293–433 nm were grown on fused silica substrates by pulsed laser deposition (PLD) of an alumina target with KrF excimer laser radiation. The effects of oxygen background pressure (0.5–50 Pa) and substrate temperature of room temperature to 800 °C were investigated on thickness, crystal-structure, optical properties and thermal stability of alumina films. It was found that PLD grows a weakly crystalline aluminum oxide film at in situ substrate temperature of 800 °C and oxygen background pressure of 5 Pa. Post-deposition annealing studies of amorphous alumina sample prepared at in situ temperature of 600 °C found that crystallization starts at 800 °C and forms δ alumina phase.
© EDP Sciences, 2013
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.