Fig. 21

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(a) Experimental variation of the Si/SiO2 interface plasmon (IPl) peak profile when the position of the e-beam with respect to the interface (x0) is varied from Si (x0 < 0) into SiO2 (x0 > 0); (b) Theoretical calculations in the non-relativistic and in the relativistic case (R) for different probe positions (x0 = –1, 2 and 5 nm), from [101].

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