Eur. Phys. J. Appl. Phys.
Volume 68, Number 1, October 2014
|Number of page(s)||9|
|Published online||10 October 2014|
Effect of thermal annealing on structural, optical and electrical properties of RF reactive magnetron sputtered CdO thin films
Department of Physics, Osmania University, Hyderabad
2 Department of Physics, Mahatma Gandhi University, Nalgonda 508254, India
a e-mail: email@example.com
Revised: 27 June 2014
Accepted: 27 August 2014
Published online: 10 October 2014
Recently, there has been a lot of interest on transparent conducting oxide (TCO) materials which have common application in solar cells and some optoelectronic devices. In this work, cadmium oxide (CdO) thin films have been deposited on glass substrates by RF reactive magnetron sputtering technique and subsequently annealed in air from 200 °C to 500 °C. The effect of annealing temperature on the structural, morphological, optical and electrical properties of CdO films is systematically investigated by X-ray diffraction, scanning electron microscopy with energy dispersive spectroscopy, atomic force microscopy, UV-visible spectrophotometer and Hall effect measurements. X-ray diffraction (XRD) studies showed that the films are polycrystalline in nature with a preferential orientation along (2 0 0) plane. Atomic force microscopy studies showed that these films are very smooth with maximum root mean square roughness of 3.13 nm. The CdO films formed at annealing temperature of 400 °C exhibited optical transmittance of 84%, electrical resistivity of 1.9 × 10−3 Ω cm and figure of merit of 1.8 × 10−3 Ω−1.
© EDP Sciences, 2014
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