Optimization of the current density distribution in electrochemical cells based on the level set method and genetic algorithm

Technical University of Cluj-Napoca, Department of Electrical Engineering, G. Baritiu Street 26-28, 400020 Cluj-Napoca, Romania

^a e-mail: marius.purcar@et.utcluj.ro

Received: 4 August 2010
Revised: 10 March 2011
Accepted: 10 June 2011
Published online: 28 September 2011

Abstract

This paper proposes a general applicable algorithm for the optimization of the current density distribution in the electrochemical cells using the insulating shields during the electroplating process. The innovative aspect is that the position of the insulating shield is displaced over a number of predefined time steps convecting its surface proportional with and in the direction of a well chosen rate provided by a genetic algorithm. The aim of this method is to develop a systematic modification of the insulating shield position in order to get a more uniform distribution of the current density, hence a more uniform deposited layer at the cathode. As the displacement of the insulating shield is performed with the Level Set Method, the re-meshing of the computational domain with finite elements is not required anymore. Finally an example related to the optimization of the current density distribution in the vicinity of a singularity (incident angle between the electrode and insulator = 180°), using an insulating shield, will be presented.