Issue |
Eur. Phys. J. Appl. Phys.
Volume 45, Number 1, January 2009
|
|
---|---|---|
Article Number | 10304 | |
Number of page(s) | 7 | |
Section | Semiconductors and Devices | |
DOI | https://doi.org/10.1051/epjap:2008190 | |
Published online | 25 December 2008 |
https://doi.org/10.1051/epjap:2008190
Laser heating of thick layers through the backwards, self-sustained propagation of a steep and steady state thermal front
Aplinov, Presvert No. 9, 38113 Veurey-Voroize, France
Corresponding author: michel.bruel@aplinov.com
Received:
26
September
2008
Revised:
30
October
2008
Accepted:
9
December
2008
Published online:
25
December
2008
We investigate theoretically a mode of heating layers using a laser beam. In this mode thermal energy, the temperature of the layer, propagates in a steady-state self sustained fashion from the bottom of the layer towards the surface and may exhibit a very steep front. The propagation exhibits a constant speed, related to the intensity of the power flux. To achieve this heating mode the absorption coefficient has to remain low in low temperatures and increase rapidly as a function of temperature in higher temperatures. Additionally, a significant temperature increase must be generated to trigger this propagation mode, for example through the presence of a strongly absorbing layer beneath the transparent layer. The mode is well suited to semiconductors, especially silicon. A few examples of applications are proposed.
PACS: 81.40.gh – Other heat and thermomechanical treatments / 81.40.tv – Optical and dielectric properties / 81.40.wx – Radiation treatment
© EDP Sciences, 2008
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