| Issue |
Eur. Phys. J. Appl. Phys.
Volume 43, Number 1, July 2008
|
|
|---|---|---|
| Page(s) | 87 - 91 | |
| Section | Laser, Optics, Optoelectronics and Nanophotonics | |
| DOI | https://doi.org/10.1051/epjap:2008126 | |
| Published online | 19 June 2008 | |
https://doi.org/10.1051/epjap:2008126
Ellipsometric investigation of porous silicon layers for the design of a DBR
Laboratoire de Photovoltaïque, des Semiconducteurs et des
Nanostructures, Centre de Recherche et des Technologies de l'énergie, BP
95 Hammam-Lif 2050, Tunisia
Corresponding author: afrah.bardaoui@crten.rnrt.tn
Received:
24
April
2008
Accepted:
13
May
2008
Published online:
19
June
2008
Porous silicon layers (PSL) were fabricated by electrochemical etching and investigated by spectroscopic ellipsometry (SE) in the energy range 0.6−5 eV. Within the effective medium approximation (EMA) and through an optical model consisting of a mixture of void and crystalline silicon (cSi), we were able to determine the porosity (void concentration) and the thicknesses of the PSL. The PSL were divided into several sublayers in order to obtain the best agreement between measured and simulated spectra. Once the etching parameters have been controlled and by choosing the appropriate conditions, it was possible to design a distributed Bragg reflector (DBR) with a high reflectivity band centered at 800 nm. This DBR consists on stacks of alternate PSL having two different refractive indices.
PACS: 61.43.Gt – Powders, porous materials / 42.79.Fm – Reflectors, beam splitters, and deflectors / 81.65.Cf – Surface cleaning, etching, patterning
© EDP Sciences, 2008
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