Issue |
Eur. Phys. J. Appl. Phys.
Volume 42, Number 1, April 2008
16th International Colloquium on Plasma Processes (CIP 2007)
|
|
---|---|---|
Page(s) | 47 - 53 | |
Section | Plasma, Discharge and Processes | |
DOI | https://doi.org/10.1051/epjap:2008021 | |
Published online | 19 March 2008 |
https://doi.org/10.1051/epjap:2008021
Pinus Pinaster surface treatment realized in spatial and temporal afterglow DBD conditions
1
Laboratoire d'Electronique des Gaz et des Plasmas, Université de
Pau et des Pays de l'Adour, 64000 Pau, France
2
Institut Pluridisciplinaire de Recherche sur l'Environnement et les
Matériaux, IPREM, Equipe Chimie Analytique Bio Inorganique et
Environnement (ECABIE), UMR (CNRS) 5254, Université de Pau et des Pays
de l'Adour, 64000 Pau, France
3
Institut Pluridisciplinaire de Recherche sur l'Environnement et les
Matériaux, IPREM, Équipe Chimie Physique (ECP), UMR (CNRS) 5254,
Université de Pau et des Pays de l'Adour, 64000 Pau, France
Corresponding author: jean-francis.loiseau@univ-pau.fr
Received:
5
July
2007
Revised:
15
October
2007
Accepted:
15
January
2008
Published online:
19
March
2008
This experimental work deals with the exposition of Pinus Pinaster wood samples to a DBD afterglow. Electrical parameters like duty cycle and injected energy in the gas are being varied and the modifications induced by the afterglow on the wood are analysed by several macroscopic and microscopic ways like wettability, XPS analyses and also soaking tests of treated wood in a commercial fungicide solution. Soaking tests show that plasma treatment could enhance the absorption of fungicide into the wood. The wettability results point out that the plasma treatment can inflict on the wood different surface properties, making it hydrophilic or hydrophobic, when varying electrical parameters. XPS analyses reveal several chemical modifications like an increase of the O/C ratio and the presence of carboxyl groups on the surface after plasma treatments.
PACS: 52.75.-d – Plasma devices / 81.65.-b – Surface treatments / 82.80.Pv – Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)
© EDP Sciences, 2008
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