Eur. Phys. J. Appl. Phys.
Volume 36, Number 2, November 2006
|Page(s)||111 - 117|
|Section||Surfaces, Interfaces and Films|
|Published online||11 October 2006|
Study on preferred crystal orientations of Mg-Zr-O composite protective layer in AC-PDP
Advanced Display Research Center, Institute of Industrial Science, The
University of Tokyo, Japan
2 Key laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, P.R. China
3 Key laboratory of Opto-Electronic Technology and Intelligent Control of Ministry of Education, Lanzhou Jiaotong University, P.R. China
Corresponding author: email@example.com
Revised: 10 May 2006
Accepted: 1 August 2006
Published online: 11 October 2006
In order to study the preferred crystal orientations of Mg-Zr-O composite protective layers in PDP, Mg-Zr-O composite protective layers were deposited by Electron-beam Evaporator using (MgO+ZrO2) powder mixture as evaporation source material. X-ray diffractometer (XRD) was used to determine preferred crystal orientations of Mg-Zr-O composite protective layers, surface morphologies of films were analyzed by FESEM and voltage characteristics were examined in a testing macroscopic discharge cell of AC-PDP. On the basis of experimental analysis, the influence of oxide addition and deposition conditions on preferred orientations of Mg-Zr-O composite protective layers were investigated. The results showed that the preferred orientations of Mg-Zr-O films were determined by lattice distortion of MgO crystal. The deposition conditions have great effects on the preferred orientations of Mg-Zr-O films. The preferred orientations affect voltage characteristics through affecting surface morphology of Mg-Zr-O films. A small amount of Zr solution in MgO can decrease firing voltage compared with using pure MgO film. Firing voltage is closely related with the [ ZrO2/(MgO+ZrO2)] ratio of evaporation source materials.
PACS: 68.55.Jk – Structure and morphology; thickness; crystalline orientation and texture / 68.55.Ln – Defects and impurities: doping, implantation, distribution, concentration, etc. / 81.15.Jj – Ion and electron beam-assisted deposition; ion plating
© EDP Sciences, 2006
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.