| Issue |
Eur. Phys. J. AP
Volume 21, Number 2, February 2003
|
|
|---|---|---|
| Page(s) | 147 - 149 | |
| Section | Imaging, Microscopy and Spectroscopy | |
| DOI | https://doi.org/10.1051/epjap:2002109 | |
| Published online | 29 November 2002 | |
https://doi.org/10.1051/epjap:2002109
Physico-chemical environment of Al impurity atoms in amorphous silica
1
Laboratoire de Chimie Physique-Matière et Rayonnement,
Université Pierre et Marie Curie, UMR-CNRS 7614, 11 rue Pierre et Marie
Curie, 75231 Paris Cedex 05, France
2
CEA/CESTA, BP 2, 33114 Le Barp, France
Corresponding author: jonnard@ccr.jussieu.fr
Received:
5
July
2002
Revised:
9
October
2002
Accepted:
11
October
2002
Published online:
29
November
2002
The physico-chemical environment around the aluminum impurity atoms in commercial Herasil silica is studied by electron-induced X-ray emission spectroscopy. Despite the low concentration of aluminum and the charging effect occurring upon electron irradiation, we have been able to characterize the environment of the Al atoms. We show that the Al atoms are in an octahedral environment, i.e. surrounded by 6 oxygen atoms. The presence of Al clusters, whose metallic character would make them candidates to be ultraviolet absorption centers, is ruled out.
PACS: 78.70.-g – Interactions of particles and radiation with matter / 78.20.-e – Optical properties of bulk materials and thin films / 71.55.Jv – Disordered structures; amorphous and glassy solids
© EDP Sciences, 2003
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