Eur. Phys. J. AP
Volume 11, Number 3, September 2000
|Page(s)||167 - 174|
|Published online||15 September 2000|
Investigation of the structure of tungsten oxide films obtained by chemical vapor deposition
Central Laboratory for Solar Energy and New Energy Sources at the Bulgarian Academy of
Sciences, 72 Tzarigradsko shose Blvd., 1784 Sofia, Bulgaria
2 Linköping University, Department of Physics and Measurement Technology, Material Science Division, S-581 83 Linköping, Sweden
3 Sofia University, Department of Physics, 5 James Boucher Blvd., Sofia, Bulgaria
Corresponding author: firstname.lastname@example.org
Revised: 8 August 2000
Accepted: 8 August 2000
Published online: 15 September 2000
Thin amorphous and polycrystalline tungsten oxide films have been prepared by Chemical Vapor Deposition (CVD) from metallorganic precursor − tungsten hexacarbonyl − at atmospheric pressure. The dependence of the composition and the structure of tungsten oxide films on the technological conditions has been investigated by XPS, XRD, DTA-TGA and Raman spectroscopy. As a result it has been established that: at high values of the flow-rates of the reaction gases amorphous films of very low density have been obtained; in the XPS spectra of the understoichiometric WO3−y (0 < y < 0.3) films besides W6+, also W5+ and W4+ states have been observed. First to observe in the Raman spectra of amorphous CVD-WO3 films is the band at ~ 950 cm−1, characteristic for terminal W6+ = O bonds in result of the presence of structural water. The existence of structural water in the amorphous material has been established by thermal analyze, also.
PACS: 61.10.-i – X-ray diffraction and scattering / 81.70.Pg – Thermal analysis, differential thermal analysis (DTA), differential thermogravimetric analysis / 82.80.Ch – Ultraviolet, visible, infrared, Raman, microwave, and magnetic resonance spectroscopic analysis methods; spectrophotometry; colorimetry
© EDP Sciences, 2000
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