Calculation of boron segregation at the Si(100)/SiO2 interface M. Furuhashi, T. Hirose, H. Tsuji, M. Tachi and K. Taniguchi Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 163-166 Published online: 15 July 2004 DOI: 10.1051/epjap:2004136