The European Physical Journal Applied Physics (EPJ AP)

Distribution and properties of oxide precipitates in annealed nitrogen doped 300 mm Si wafers

V. D. Akhmetov, H. Richter, W. Seifert, O. Lysytskiy, R. Wahlich, T. Müller and M. Reiche

Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 159-161

Published online: 15 July 2004

DOI: 10.1051/epjap:2004084

V. D. Akhmetov

H. Richter

W. Seifert

O. Lysytskiy

R. Wahlich

T. Müller

M. Reiche

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