The European Physical Journal Applied Physics (EPJ AP)

A study of growth mechanism of microcrystalline thin silicon films deposited at low temperature by SiF₄-H₂-He PECVD

M. Losurdo, M. Giangregorio, A. Grimaldi, P. Capezzuto and G. Bruno

Eur. Phys. J. Appl. Phys., 26 3 (2004) 187-192

Published online: 03 May 2004

DOI: 10.1051/epjap:2004032

M. Losurdo

M. Giangregorio

A. Grimaldi

P. Capezzuto

G. Bruno

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