The European Physical Journal Applied Physics (EPJ AP)

Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materials

Hoelen L. Lalandec Robert, Max Leo Leidl, Knut Müller-Caspary and Jo Verbeeck

Eur. Phys. J. Appl. Phys., 100 (2025) 20

Published online: 30 July 2025

DOI: 10.1051/epjap/2025018

Hoelen L. Lalandec Robert

Max Leo Leidl

Knut Müller-Caspary

Jo Verbeeck

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