The European Physical Journal Applied Physics (EPJ AP)

Polycrystalline silicon thin films on glass deposited from chlorosilane at intermediate temperatures

A. G. Benvenuto, R. H. Buitrago and J. A. Schmidt

Eur. Phys. J. Appl. Phys., 58 2 (2012) 20101

Published online: 09 May 2012

DOI: 10.1051/epjap/2012110311

A. G. Benvenuto

R. H. Buitrago

J. A. Schmidt

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