Magnetoresistance studies and optimization of deposition parameters of pulsed electron deposited La0.6Pb0.4Mn0.8Ru0.2O3 thin films
Eur. Phys. J. Appl. Phys., 55 2 (2011) 20301
Published online: 11 August 2011
DOI: 10.1051/epjap/2011100456