The European Physical Journal Applied Physics (EPJ AP)

In situ diagnostic of etch plasmas for process control using quantum cascade laser absorption spectroscopy

N. Lang, J. Röpcke, S. Wege and A. Steinbach

Eur. Phys. J. Appl. Phys., 49 1 (2010) 13110

Published online: 11 December 2009

DOI: 10.1051/epjap/2009198

N. Lang

J. Röpcke

S. Wege

A. Steinbach

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