The European Physical Journal Applied Physics (EPJ AP)

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Forthcoming articles

The European Physical Journal Applied Physics (EPJ AP) gives online access to unedited preprint version of accepted papers, ahead of publication. This online version does not take into account corrections made during production process.

Online access to PDF files is granted to subscribers.

Investigation of mechanical stresses in β-Ga2O3 films obtained by Radio Frequency Magnetron Sputtering on porous-Si/Si substrate

Andriy S. Revenko, Valerii V. Kidalov, Mykhailo P. Derhachov, Roman A. Redko, Robert P. Johnson, Mark A. Assmann, Olexandr I. Gudimenko, Olexii O. Sushko and Mykhailo M. Koptiev

Eur. Phys. J. Appl. Phys., Forthcoming article

Received: 27 March 2025 / Revised: 26 May 2025 / Accepted: 11 July 2025

DOI: https://doi.org/10.1051/epjap/2025021

PDF (597.2 KB)

Special Issue on ‘Electromagnetic modeling: from material properties to energy systems (Numelec 2024)’, edited by Lionel Pichon and Junwu Tao

Application of HBM and POD for Insulation Assessment of Oil-paper Insulation System with Nonlinear Properties

Cheng Chi, Zhuoxiang Ren and Fan Yang

Eur. Phys. J. Appl. Phys., Forthcoming article

Received: 21 September 2024 / Revised: 18 June 2025 / Accepted: 09 July 2025

DOI: https://doi.org/10.1051/epjap/2025020

PDF (1.209 MB)

Special Issue on ‘Imaging, Diffraction, and Spectroscopy on the micro/nanoscale (EMC 2024)’, edited by Jakob Birkedal Wagner and Randi Holmestad

In-situ liquid phase TEM of trapped nanoparticles: native-state observation and structural characterization

Joakim Lajer, Sofie Tidemand-Lichtenberg, Niccolò Bottauscio, Mervan Ramadan, Emil C. S. Jensen and Kristian S. Mølhave

Eur. Phys. J. Appl. Phys., Forthcoming article

Received: 11 March 2025 / Revised: 18 June 2025 / Accepted: 30 June 2025

DOI: https://doi.org/10.1051/epjap/2025019

PDF (4.001 MB)

Special Issue on ‘Imaging, Diffraction, and Spectroscopy on the micro/nanoscale (EMC 2024)’, edited by Jakob Birkedal Wagner and Randi Holmestad

Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materials

Hoelen L. Lalandec Robert, Max Leo Leidl, Knut Müller-Caspary and Jo Verbeeck

Eur. Phys. J. Appl. Phys., Forthcoming article

Received: 06 December 2024 / Revised: 19 May 2025 / Accepted: 23 May 2025

DOI: https://doi.org/10.1051/epjap/2025018

PDF (30.97 MB)