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Simulations of film growth and diffusion during the corrosion process

A. Taleb, J. Stafiej, A. Chaussé, R. Messina and J.P. Badiali
Journal of Electroanalytical Chemistry 500 (1-2) 554 (2001)
DOI: 10.1016/S0022-0728(00)00433-2
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