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Annealing effect in DC and RF sputtered ITO thin films

L. Kerkache, A. Layadi, E. Dogheche and D. Rémiens
The European Physical Journal Applied Physics 39 (1) 1 (2007)
DOI: 10.1051/epjap:2007113
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Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films

L. Kerkache, A. Layadi and A. Mosser
Journal of Alloys and Compounds 485 (1-2) 46 (2009)
DOI: 10.1016/j.jallcom.2009.06.103
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Physical properties of RF sputtered ITO thin films and annealing effect

L Kerkache, A Layadi, E Dogheche and D Rémiens
Journal of Physics D: Applied Physics 39 (1) 184 (2006)
DOI: 10.1088/0022-3727/39/1/027
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Effect of thickness on the physical properties of ITO thin films

A. Guittoum, L. Kerkache and A. Layadi
The European Physical Journal Applied Physics 7 (3) 201 (1999)
DOI: 10.1051/epjap:1999214
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