Eur. Phys. J. AP
Volume 1, Number 2, February 1998
|Page(s)||177 - 180|
|Published online||15 February 1998|
Structural and electrical properties of as-deposited and annealed DC sputtered ITO thin films*
Institut de Physique, Université Ferhat Abbas,
Setif 19000, Algeria
Revised: 31 July 1997
Accepted: 29 September 1997
Published online: 15 February 1998
We have studied the effect of annealing on the structural and electrical properties of tin-doped indium oxyde, (ITO), thin films prepared by DC sputtering at different partial pressure of oxygen (ppo). Annealing experiments have been done in vacuum and in Ar atmosphere up to a temperature of 450 °C. A change of texture from to as the ppo was increased was noted in the as-deposited films. Annealing induced cristallinity and improved the texture of these films. The lattice constant decreased after annealing. The (222) grain size increased after vacuum annealing but was unaffected by annealing in Ar atmosphere; while the (400) grain size decreased for samples having the texture. The electrical resistivity decreases sharply after annealing to a minimum value of 87 × 10-4 Ω cm .
PACS: 68.55.-a – Thin film structure and morphology / 68.55.Jk – Structure and morphology; thickness / 81.15.Cd – Deposition by sputtering / 81.40.Rs – Electrical and magnetic properties (related to treatment conditions)
© EDP Sciences, 1998
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