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Cited article:

Atomic scale study of InP etching by Cl₂-Ar ICP plasma discharge

A. Rhallabi, R. Chanson, J.-P. Landesman, C. Cardinaud, M.-C. Fernandez

Eur. Phys. J. Appl. Phys., 53 3 (2011) 33606

Published online: 2011-02-22

DOI: https://doi.org/10.1051/epjap/2010100056

This article has been cited by the following article(s):

Dynamic global model of Cl2/Ar plasmas: Applicability to atomic layer etching processes

T. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel and A. Rhallabi
Journal of Vacuum Science & Technology A 42 (6) (2024)
https://doi.org/10.1116/6.0003932

Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution

Romain Chanson, Ahmed Rhallabi, Marie Claude Fernandez and Christophe Cardinaud
Plasma Processes and Polymers 10 (3) 213 (2013)
https://doi.org/10.1002/ppap.201200083

Global Model of $\hbox{Cl}_{2}\hbox{/Ar}$ High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP

R. Chanson, A. Rhallabi, M. C. Fernandez, et al.
IEEE Transactions on Plasma Science 40 (4) 959 (2012)
https://doi.org/10.1109/TPS.2012.2183391