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Cited article:

Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C₂H₄/N₂ townsend dielectric barrier discharge

C. Sarra-Bournet, N. Gherardi, S. Turgeon, G. Laroche, F. Massines

Eur. Phys. J. Appl. Phys., 47 2 (2009) 22820

Published online: 2009-04-28

DOI: https://doi.org/10.1051/epjap/2009079

This article has been cited by the following article(s):

Kinetics driving thin-film deposition in dielectric barrier discharges using a direct liquid injector operated in a pulsed regime

L Cacot, G Carnide, M L Kahn, et al.
Journal of Physics D: Applied Physics 55 (47) 475202 (2022)
https://doi.org/10.1088/1361-6463/ac94de

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Francoise Massines, Christian Sarra‐Bournet, Fiorenza Fanelli, Nicolas Naudé and Nicolas Gherardi
Plasma Processes and Polymers 9 (11-12) 1041 (2012)
https://doi.org/10.1002/ppap.201200029

Effect of C2H4/N2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H)

Christian Sarra-Bournet, Nicolas Gherardi, Hervé Glénat, Gaétan Laroche and Francoise Massines
Plasma Chemistry and Plasma Processing 30 (2) 213 (2010)
https://doi.org/10.1007/s11090-010-9214-y

Formation of nanoparticles and nanorods in a N2–C2H4–H2 atmospheric pressure dielectric barrier Townsend discharge

Christian Sarra-Bournet, Nicolas Gherardi, Gaétan Laroche and Francoise Massines
Thin Solid Films 518 (17) 4828 (2010)
https://doi.org/10.1016/j.tsf.2010.01.062