Articles citing this article

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Cited article:

High-density microwave plasma of SiH₄/H₂ for high rate growth of highly crystallized microcrystalline silicon films

H. Jia, J. K. Saha, N. Ohse, H. Shirai

Eur. Phys. J. Appl. Phys., 33 3 (2006) 153-159

Published online: 2006-02-22

DOI: https://doi.org/10.1051/epjap:2006018

This article has been cited by the following article(s):

Low Temperature Plasma Technology

Shaoqing Xiao, Shuyan Xu and Haiping Zhou
Low Temperature Plasma Technology 287 (2013)
https://doi.org/10.1201/b15153-14

Photovoltaics literature survey (No. 47)

Avi Shalav
Progress in Photovoltaics: Research and Applications 14 (5) 463 (2006)
https://doi.org/10.1002/pip.722