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Cited article:
H. Nishiyama , M. Shigeta
Eur. Phys. J. AP, 18 2 (2002) 125-133
Published online: 2002-05-15
This article has been cited by the following article(s):
21 articles
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Plasma chemical behaviour of reactants and reaction products during inductively coupled CF4plasma etching of SiO2
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Two-dimensional analysis of nanoparticle formation in induction thermal plasmas with counterflow cooling
Masaya Shigeta and Takayuki Watanabe Thin Solid Films 516 (13) 4415 (2008) https://doi.org/10.1016/j.tsf.2007.10.022
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Multi-component co-condensation model of Ti-based boride/silicide nanoparticle growth in induction thermal plasmas
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Modeling of non-equilibrium argon–hydrogen induction plasmas under atmospheric pressure
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Numerical Investigation of a Local Oxygen Injection Effect on Argon Induction Plasmas Using a Chemically Non-Equilibrium Model
Masaya Shigeta, Nobuhiko Atsuchi and Takayuki Watanabe JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 39 (12) 1255 (2006) https://doi.org/10.1252/jcej.39.1255
Modeling of non-equilibrium argon–oxygen induction plasmas under atmospheric pressure
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<tex>$hboxCF _4$</tex>Decomposition Using Inductively Coupled Plasma: Effect of Power Frequency
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Numerical Analysis of Metallic Nanoparticle Synthesis Using RF Inductively Coupled Plasma Flows
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Numerical analysis for co-condensation processes in silicide nanoparticle synthesis using induction thermal plasmas at atmospheric pressure conditions
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Numerical Analysis for Preparation of Silicon-Based Intermetallic Nano-Particles in Induction Thermal Plasma Flow Systems
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Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma
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Computational simulation of a particle-laden RF inductively coupled plasma with seeded potassium
M. Shigeta, T. Sato and H. Nishiyama International Journal of Heat and Mass Transfer 47 (4) 707 (2004) https://doi.org/10.1016/j.ijheatmasstransfer.2003.08.007
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Numerical simulation of a potassium-seeded turbulent RF inductively coupled plasma with particles
Masaya Shigeta, Takehiko Sato and Hideya Nishiyama Thin Solid Films 435 (1-2) 5 (2003) https://doi.org/10.1016/S0040-6090(03)00366-3