| Issue |
Eur. Phys. J. AP
Volume 18, Number 2, May 2002
|
|
|---|---|---|
| Page(s) | 125 - 133 | |
| Section | Imaging, Microscopy and Spectroscopy | |
| DOI | https://doi.org/10.1051/epjap:2002034 | |
| Published online | 15 May 2002 | |
https://doi.org/10.1051/epjap:2002034
Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal
Institute of Fluid Science, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai,
980-8577, Japan
Corresponding authors: nishiyama@ifs.tohoku.ac.jp shigeta@paris.ifs.tohoku.ac.jp
Received:
16
August
2001
Revised:
4
December
2001
Accepted:
7
January
2002
Published online: 15 May 2002
The functions of the plasma flow such as electrical conductivity, thermal conduction and chemical reaction can be enhanced by seeding vaporized alkali metal with low ionization potential. In the present study, numerical simulation is conducted for the radio frequency inductively coupled plasma of which functions are enhanced by seeding a small amount of vaporized alkali metal. The effects of seeding, injection flow rate and applied coil frequency on the plasma characteristics are clarified by relating to the flow structure and electromagnetic effect.
PACS: 52.30.Cv – Magnetohydrodynamics (including electron magnetohydrodynamics) / 52.65.Kj – Magnetohydrodynamic and fluid equation / 52.80.Pi – High-frequency and RF discharges
© EDP Sciences, 2002
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