Dissociation of N2 in flowing glow discharge: Influence of H2
Eur. Phys. J. AP, 5 2 (1999) 185-189
Published online: 1999-02-15
Articles citing this article
The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).
Cited article:
This article has been cited by the following article(s):
Characterization of a DC glow discharge in N2–H2 with electrical measurements and neutral and ion mass spectrometry
Audrey Chatain, Ana Sofia Morillo-Candas, Ludovic Vettier, Nathalie Carrasco, Guy Cernogora and Olivier GuaitellaPlasma Sources Science and Technology 32 (3) 035002 (2023)
https://doi.org/10.1088/1361-6595/acc132
Effect of Nitrogen Additive on Inhomogeneous Microwave Discharge in Hydrogen at Reduced Pressures
Yu. A. Lebedev, A. V. Tatarinov and I. L. EpsteinPlasma Physics Reports 45 (4) 397 (2019)
https://doi.org/10.1134/S1063780X19030061
Effect of Excitation and Vibrational Temperature on the Dissociation of Nitrogen Molecules in Ar-N2Mixture RF Discharge
F. U. Khan, N. U. Rehman, S. Naseer, et al.Spectroscopy Letters 44 (3) 194 (2011)
https://doi.org/10.1080/00387010.2010.497527
Influence of C4F8/Ar-based etching and H2-based remote plasma ashing processes on ultralow k materials modifications
Ming-Shu Kuo, Xuefeng Hua, G. S. Oehrlein, et al.Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 28 (2) 284 (2010)
https://doi.org/10.1116/1.3308623
Diagnostics of N2–Ar plasma mixture excited in a 13.56 MHz hollow cathode discharge system: application to remote plasma treatment of polyamide surface
S Saloum, M Naddaf and B AlkhaledJournal of Physics D: Applied Physics 41 (4) 045205 (2008)
https://doi.org/10.1088/0022-3727/41/4/045205
Polystyrene thin films treatment under DC pulsed discharge in nitrogen: effect of sample placement and glow duration on the wettability
J. Larrieu, B. Held, N. Soulem and N. SpyrouThe European Physical Journal Applied Physics 29 (2) 181 (2005)
https://doi.org/10.1051/epjap:2004192
Improvement of the PLD process assisted by RF plasma for AlN growth
A. Basillais, R. Benzerga, H. Sanchez, et al.Applied Physics A 80 (4) 851 (2005)
https://doi.org/10.1007/s00339-003-2325-z
DC pulsed plasma surface treatment of polystyrene thin films with nitrogen: study of the correlation between energy distribution and wettability
J. Larrieu, B. Held, F. Clément, N. Soulem and D. DuboisThe European Physical Journal Applied Physics 26 (2) 113 (2004)
https://doi.org/10.1051/epjap:2004024
Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma
N. Itagaki, S. Iwata, K. Muta, et al.Thin Solid Films 435 (1-2) 259 (2003)
https://doi.org/10.1016/S0040-6090(03)00395-X
Polystyrene thin films treatment under DC pulsed discharges conditions in nitrogen-argon and oxygen-argon mixtures
F. Clément, B. Held and N. SoulemThe European Physical Journal Applied Physics 17 (2) 119 (2002)
https://doi.org/10.1051/epjap:2002004
XPS analyses of polystyrene thin films treated under DC pulsed discharges conditions in nitrogen, oxygen and oxygen-argon mixtures
F. Clément, B. Held, N. Soulem and C. GuimonThe European Physical Journal Applied Physics 18 (2) 135 (2002)
https://doi.org/10.1051/epjap:2002035
Influence of the growth conditions of AlN and GaN films by reactive laser ablation
Armelle Basillais, Chantal Boulmer-Leborgne, Jacky Mathias and Jacques PerrièreApplied Surface Science 186 (1-4) 416 (2002)
https://doi.org/10.1016/S0169-4332(01)00707-3
Relaxation of the electron energy distribution function in the afterglow of aN2microwave discharge including space-charge field effects
V. Guerra, P. A. Sá and J. LoureiroPhysical Review E 63 (4) (2001)
https://doi.org/10.1103/PhysRevE.63.046404
Enhancement of the molecular nitrogen dissociation levels by argon dilution in surface-wave-sustained plasmas
M. Tabbal, M. Kazopoulo, T. Christidis and S. IsberApplied Physics Letters 78 (15) 2131 (2001)
https://doi.org/10.1063/1.1359775
Role of long-lived N2(X1Σg+,v) molecules and N2(A3Σu+) and N2(a'1Σu-) states in the light emissions of an N2afterglow
J Loureiro, P A Sá and V GuerraJournal of Physics D: Applied Physics 34 (12) 1769 (2001)
https://doi.org/10.1088/0022-3727/34/12/303