Eur. Phys. J. AP
Volume 5, Number 2, February 1999
|Page(s)||185 - 189|
|Published online||15 February 1999|
Dissociation of N2 in flowing glow discharge: Influence of H2*
Laboratório de Materiais, EMC, UFSC
88040-900-Florianópolis, SC, Brazil
2 Laboratório de Materiais, EMC, UFSC 88040-900-Florianópolis, SC, Brazil CPAT, Université Paul Sabatier, 118 route de Narbonne, 31062 Toulouse Cedex, France
Revised: 15 May 1998
Revised: 6 October 1998
Accepted: 6 October 1998
Published online: 15 February 1999
The N2 dissociation yield has been measured in a flowing post-discharge containing H2 between 0 to 5%. The N atom density has been determined in the fast post-discharge (Δt = 5 × 10−2 s) electric field has been measured by electrostatic probes as a function of H2 relative concentration. It is demonstrated that the H2 produces a significant increase in the N-atom concentration measured in the post-discharge. For our experimental conditions it was determined an increase up to 3 times in comparison to pure nitrogen discharge. The maximum yield of N-atoms was obtained for a H2 relative concentration of about 2%. This result cannot only be explained by the decrease of N atoms surface losses. It is demonstrated that the N2 dissociation increase is also the result of an increase of the discharge reduced electric field.
PACS: 52.80.-s – Electric discharges / 52.25.-b – Plasma properties / 52.20.-j – Elementary processes in plasma
© EDP Sciences, 1999
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