Articles citing this article

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Cited article:

Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materials

Hoelen L. Lalandec Robert, Max Leo Leidl, Knut Müller-Caspary, Jo Verbeeck

Eur. Phys. J. Appl. Phys., 100 (2025) 20

Published online: 2025-07-30

DOI: https://doi.org/10.1051/epjap/2025018

This article has been cited by the following article(s):

Improving the low-dose performance of aberration correction in single sideband ptychography

Songge Li, Nicolas Gauquelin, Hoelen L. Lalandec Robert, Arno Annys, Chuang Gao, Christoph Hofer, Timothy J. Pennycook and Jo Verbeeck
Ultramicroscopy 277 114225 (2025)
https://doi.org/10.1016/j.ultramic.2025.114225