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Effects of substrate bias on the properties of TiCrN films deposited on 316L by RF magnetron sputtering
Noureddine Madaoui, Mourad Azibi, Ferroudja Lemdani, Meriem Sanaa and Nadia Saoula Zeitschrift für Naturforschung A 80(8) 753 (2025) https://doi.org/10.1515/zna-2025-0067
Examining the microstructure, morphological features, and wetting characteristics of Ti/TiN/TiAlN thin films produced through RF/DC magnetron co-sputtering
Hichem Benzouid, Said Boudebane, Hana Ferkous, Fouaz Lekoui, Nafarizal Bin Nayan, Amel Delimi, Maha Awjan Alreshidi, Muhammad Arshad, Krishna Kumar Yadav, Barbara Ernst, Noureddine Elboughdiri and Yacine Benguerba Materials Today Communications 37 107405 (2023) https://doi.org/10.1016/j.mtcomm.2023.107405
Variation on the Microstructure and Mechanical Properties of Ti-Al-N Films Induced by RF-ICP Ion Source Enhanced Reactive Nitrogen Plasma Atmosphere