Regular Article

Bias voltage effect on magnetron sputtered titanium aluminum nitride TiAlN thin films properties

¹ Equipe Plasma & Applications, Division des Milieux ionisés et Laser, Centre de Développement des Technologies Avancées, Baba Hassen, Alger, Algeria
² Unité de Recherche Matériaux, Procédés et Environnement, Université M’hamed Bougara, Boumerdès, Algeria
³ Material Physics Research Institute, School of Physics, and Materials for Energy Research Group, University of the Witwatersrand, Johannesburg 2050, South Africa

^* e-mail: az.aitdjafer@gmail.com

Received: 27 November 2018
Received in final form: 9 May 2019
Accepted: 4 June 2019
Published online: 30 July 2019

Abstract

In this study, a negative substrate bias voltage is used to tune the structural, morphological, mechanical and electrochemical properties of TiAlN coatings fundamental for protective coating applications. TiAlN thin films have been deposited on glass, (001)Si and stainless steel substrates by RF magnetron sputtering at a power density of 4.41 W/cm². The deposition rate was determined from X-ray reflectivity measurements to 7.00 ± 0.05 nm/min. TiAlN films used in this work were deposited for 60 min to yield a film thickness of 420 nm. Structural analysis has shown that TiAlN coating forms a cubic (fcc) phase with orientations in (111), (200), (220) and (222) planes. The deposited coatings present maximum hardness (H = 37.9 GPa) at −75 V. The dependence of hardness and Young's modulus and corrosion resistance on microstructure has been established. Electrochemical studies by potentiodynamic polarization in aggressive environment (3.5 wt.% NaCl) have revealed that stainless steel substrate with TiAlN coating exhibits excellent corrosion resistance.