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Cited article:

Depth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron

Carlos Macchi, Juan Bürgi, Javier García Molleja, Sebastiano Mariazzi, Mattia Piccoli, Edoardo Bemporad, Jorge Feugeas, Roberto Sennen Brusa, Alberto Somoza

Eur. Phys. J. Appl. Phys., 67 2 (2014) 21301

Published online: 2014-08-01

DOI: https://doi.org/10.1051/epjap/2014140191

This article has been cited by the following article(s):

Synchrotron Radiation Applied to Real-Time Studies of the Kinetics of Growth of Aluminum Nitride Thin Multilayers

J. García Molleja, J. Bürgi, G. Kellermann, et al.
The Journal of Physical Chemistry B 123 (7) 1679 (2019)
https://doi.org/10.1021/acs.jpcb.8b09496

($ \begin{array}{ccc}1& 0& \begin{array}{cc}\bar{1}& 1\end{array}\end{array}$) preferential orientation of polycrystalline AlN grown on SiO2/Si wafers by reactive sputter magnetron technique

Juan Bürgi, Javier García Molleja, Raúl Bolmaro, et al.
The European Physical Journal Applied Physics 74 (1) 10301 (2016)
https://doi.org/10.1051/epjap/2016150446

Modeling of very thin aluminum nitride film mechanical properties from nanoindentation measurements

F. Roudet, D. Chicot, X. Decoopman, et al.
Thin Solid Films 594 129 (2015)
https://doi.org/10.1016/j.tsf.2015.10.010