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Cited article:

Polycrystalline silicon thin films on glass deposited from chlorosilane at intermediate temperatures

A. G. Benvenuto, R. H. Buitrago, J. A. Schmidt

Eur. Phys. J. Appl. Phys., 58 2 (2012) 20101

Published online: 2012-05-09

DOI: https://doi.org/10.1051/epjap/2012110311

This article has been cited by the following article(s):

Doped Polycrystalline Silicon Thin Films Deposited on Glass from Trichlorosilane**

Ariel G. Benvenuto, Román H. Buitrago and Javier A. Schmidt
Chemical Vapor Deposition 21 (1-2-3) 54 (2015)
https://doi.org/10.1002/cvde.201407139

Characterization of thin polycrystalline silicon films deposited on glass by CVD

A G Benvenuto, R H Buitrago, A Bhaduri, C Longeaud and J A Schmidt
Semiconductor Science and Technology 27 (12) 125013 (2012)
https://doi.org/10.1088/0268-1242/27/12/125013