Towards control of plasma-induced surface roughness: simultaneous to plasma etching deposition
Eur. Phys. J. Appl. Phys., 56 2 (2011) 24012
Published online: 2011-10-28
Articles citing this article
The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).
Cited article:
This article has been cited by the following article(s):
Roughness development in plasma etching under shadowing effect
Xiaolong Jiang, Chuanchao Zhang, Xiaoyu Luan, Hongping Tang, Qinghua Deng, Baoshen Jia, Jingxuan Wang, Wei Liao, Wei Ni and Qihua ZhuApplied Surface Science 715 164617 (2026)
https://doi.org/10.1016/j.apsusc.2025.164617
Ideal Photothermal Materials Based on Ge Subwavelength Structure
Jingjun Wu, Kaixuan Wang, Cong Wei, Jun Ma, Hongbo Xu, Wanguo Zheng and Rihong ZhuMolecules 29 (21) 5008 (2024)
https://doi.org/10.3390/molecules29215008
Kinetic etch front instability responsible for roughness formation in plasma etching
Xiaolong Jiang, Lixiang Wu, Ke Yang, Taixiang Liu, Wei Liao, Chuanchao Zhang, Lijuan Zhang, Ying Liu and Xiaodong JiangApplied Surface Science 543 148862 (2021)
https://doi.org/10.1016/j.apsusc.2020.148862
Enhanced ultrabroadband antireflection properties of ZnTe crystal with sub-wavelength surface structures by maskless reactive ion etching method
Ce Zhou, Jiangpeng Dong, Binbin Zhang, et al.Superlattices and Microstructures 137 106353 (2020)
https://doi.org/10.1016/j.spmi.2019.106353
A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication
Athanasios Smyrnakis, Angelos Zeniou, Kamil Awsiuk, Vassilios Constantoudis and Evangelos GogolidesFrontiers of Chemical Science and Engineering 13 (3) 475 (2019)
https://doi.org/10.1007/s11705-019-1809-0
Plasma-Induced, Self-Masking, One-Step Approach to an Ultrabroadband Antireflective and Superhydrophilic Subwavelength Nanostructured Fused Silica Surface
Xin Ye, Ting Shao, Laixi Sun, et al.ACS Applied Materials & Interfaces 10 (16) 13851 (2018)
https://doi.org/10.1021/acsami.8b01762
Origin of plasma-induced surface roughening and ripple formation during plasma etching: The crucial role of ion reflection
Takumi Hatsuse, Nobuya Nakazaki, Hirotaka Tsuda, Yoshinori Takao, Koji Eriguchi and Kouichi OnoJournal of Applied Physics 124 (14) (2018)
https://doi.org/10.1063/1.5041846
Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation
Kouichi Ono, Nobuya Nakazaki, Hirotaka Tsuda, Yoshinori Takao and Koji EriguchiJournal of Physics D: Applied Physics 50 (41) 414001 (2017)
https://doi.org/10.1088/1361-6463/aa8523
Multiscale Modeling of Low Pressure Plasma Etching Processes: Linking the Operating Parameters of the Plasma Reactor with Surface Roughness Evolution
Sotiris Mouchtouris and George KokkorisPlasma Processes and Polymers 14 (4-5) (2017)
https://doi.org/10.1002/ppap.201600147
Three-dimensional plasma micro–nanotextured cyclo-olefin-polymer surfaces for biomolecule immobilization and environmentally stable superhydrophobic and superoleophobic behavior
Kosmas Ellinas, Katerina Tsougeni, Panagiota S. Petrou, George Boulousis, Dimitris Tsoukleris, Evangelia Pavlatou, Angeliki Tserepi, Sotirios E. Kakabakos and Evangelos GogolidesChemical Engineering Journal 300 394 (2016)
https://doi.org/10.1016/j.cej.2016.04.137
Encyclopedia of Plasma Technology
Encyclopedia of Plasma Technology 1125 (2016)https://doi.org/10.1081/E-EPLT-120052496
The potential of ion-driven etching with simultaneous deposition of impurities for inducing periodic dots on surfaces
George Kokkoris and Evangelos GogolidesJournal of Physics D: Applied Physics 45 (16) 165204 (2012)
https://doi.org/10.1088/0022-3727/45/16/165204